"I consider myself lucky to have received valuable mentoring feedback over the years, often from older, more experienced colleagues. Now that I'm in the second stage of my career, I try to pay that forward."
Patrick Tinnemans has superb mathematical skills which he uses to tackle complex mathematical-physics problems and find practical solutions.
Patrick’s algorithms are used every day in fabs across the globe to obtain robust overlay, alignment and imaging in ASML’s lithography systems.
Get to know Patrick
- ASML employee since 2000
- Named a Fellow in 2018
- Based in Veldhoven, the Netherlands
Key contributions
- Correction of mark-deformation through measurement of pupil intensity for ORION wafer alignment sensor
Expertise
Mathematics, physics
Patents
Holds 87 US patents across 67 ASML patent families
