"As an engineer, nothing is more fun for me than making complex things work, either at a small scale at home or a large scale at ASML."
Hans Butler is an expert in lithography system dynamics and control with an impressive IP portfolio and a dedication to educating future generations of control engineers . He takes an integrated view on scanner module dynamics and their interaction, as well as on the control architecture, to optimize overall system accuracy.
In 2012, Hans became part-time professor at Eindhoven University of Technology, and has written a book on lithography system dynamics and control that is widely viewed as a “must read for mechatronics engineers." Hans was appointed an ASML Fellow and then Senior Fellow for his ongoing commitment and achievements in applying his thorough understanding of lithography system dynamics and control to improve overall system performance.
Get to know Hans
- ASML employee since 1991
- Named a Senior Fellow in 2023
- Based in Veldhoven, the Netherlands
Key contributions
- Control technologies for stages and other scanner modules
- System dynamics solutions to reduce overlay errors
- Contributed to the dynamic architecture of the 450 mm QXT, NXE and EXE platforms
Expertise
Lithography system dynamics and control
Patents
Holds 146 US patents across 110 ASML patent families
