“Droplet generation in a high-volume source is hard! It’s one thing to design it on paper, but then to build a robust, manufacturable product is something else. The collaboration between D&E and the factory is critical to our success.”
Bob was awarded an ASML Fellowship in recognition of his many innovations in (tin) droplet generation within ASML EUV sources. By engineering the performance and reliability of droplet generation, Bob has played an important role in enabling a high-power EUV light source for commercial microchip production.
Customers and colleagues alike praise both his technical expertise and his open, collaborative mindset. Active in research, design, engineering and manufacturing for the droplet generator, Bob continues to help customers improve the reliability and output of their operations.
Get to know Bob
- ASML employee since 2016
- Named a Fellow in 2024
- Based in San Diego, USA
Key contributions
- EUV lightsource droplet generator
- Performance innovations for EUV power scaling for more wafer throughput
- Reliability improvements for higher EUV machine availability
Expertise
EUV light sources and droplet generation
Patents
24 US patents (granted or pending) across 11 ASML patent families
Meet more Fellows
