“Working on dose control in the EUV source is challenging, but above all fun. Going through the whole cycle – analyze the problem, define the solution, demonstrate the customer benefits – as a team is very rewarding. And the occasional problem during integration brings valuable learnings for future improvements.”
Oscar is an expert in dose control, and his expertise has helped drive productivity gains in ASML’s EUV lithography systems over many years. His contribution is hugely appreciated by our customers for helping increase their yields of good wafers at higher productivity and throughput levels.
Inspired by his work, ASML and Cymer have incorporated dedicated optical hardware to reduce laser speckle and improve line edge roughness and critical dimension uniformity.
Get to know Oscar
- ASML employee since 1998
- Named a Fellow in 2024
- Based in Veldhoven, the Netherlands
Key contributions
- Improving the yield and productivity of EUV lithography systems
- Reducing the dose margin of EUV sources from 35% to 10% over ten years
Expertise
Source and optical systems
Patents
25 US patents (granted or pending) across 19 ASML patent families
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