“Never rely on experiments alone or on (physical) modeling alone. Always try to challenge one against the other to triangulate what could be(come) the truth or the best next experiment or model.”
After joining ASML as an engineer at the very beginning of our journey, Martin played a key role in driving ASML’s technology and innovation success. He rose through the ranks to become our Chief Technology Officer and President, in the process helping to shape the entire semiconductor industry. Martin retired as President and CTO of ASML in April 2024, but remains active as an advisor to the Board.
Get to know Martin
- Joined ASML in 1984
- Named an Honorary Fellow in 2024
- Based in Veldhoven, the Netherlands
Key contributions
- Mask to Wafer alignment method based on phase gratings that is still used today, almost 40 years later
- Project lead for ASML’s first step-and-scan system: the PAS 5500
- Development of ASML’s unique TWINSCAN dual-stage technology
- Development of immersion lithography
- Development of EUV lithography
- Vision for the Holistic Lithography concept that combines lithography, metrology and computational lithography
Expertise
- Mechatronics
- Thermodynamics
- Optics and imaging
- Electrical engineering
- Alignment and overlay
- Metrology
- Systems engineering
- Integrating disciplines
Patents
38 US patents (granted or pending) across 22 ASML patent families
