ASML sets productivity records across spectrum of TWINSCAN models

ASML Holding NV (ASML) today announces that productivity records have been set by its TWINSCAN platform of lithography systems. 76 TWINSCAN systems have now reached the milestone of processing more than one million wafers over 12 months.

In October 2007, a TWINSCAN XT:400E i-line scanner was the first system to process one million wafers within a 365-day period. One year later, that achievement has grown to 76 systems and includes i-line, KrF and ArF models. Approximately two-thirds of the record-setting systems are processing 300 mm wafers, with the remaining third running 200-mm wafers.

“Three years ago we started an ambitious productivity program. We set a target that a customer should be able to process one million wafers on one scanner within one year. We knew this would require innovative improvements in design as well as improved integration with remote and on-site customer service. Many customers used the opportunity to introduce their own process flow improvements to the program. Thanks to this combined focus and dedication, we managed to set a new standard in lithography productivity,” said Frits van Hout, designate member of ASML’s Board of Management who was in charge of Customer Service at the start of the program.

“These achievements demonstrate ASML’s commitment to continuous improvement of value of ownership for our customers, whether through shrink of features or, as in this case, higher productivity,” said Martin van den Brink, ASML’s executive vice president of marketing and technology. “By providing industry-leading productivity ASML’s customers benefit as they have an opportunity to produce more chips and generate more revenue.”